IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings Impact factor 2025

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The latest impact factor of IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings and all the other Web of Science journals was released on 20th June 2025 by Clarivate. Through this web page, researchers can check the impact factor, total citation, journal quartile, and journal aim & scope.

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings: Aim & Scope

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings is a Web of Science indexed journal tha publishes research in the area: Electrical and Electronic Engineering; Electronic, Optical and Magnetic Materials; Engineering (miscellaneous); Industrial and Manufacturing Engineering.
The ISSN of this journal is 1523553X, 10788743.

Impact factor of IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Journal Title	IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
Impact Factor
SJR	0.289
ISSN	1523553X, 10788743
Quartile	-

The Journal Impact Factor is defined as citations to the journal in the JCR year to items published in the previous two years, divided by the total number of scholarly items, also known as citable items, (these comprise articles and reviews) published in the journal in the previous two years.

Impact factor data has a strong influence on the scientific community, affecting decisions on where to publish, whom to promote or hire, the success of grant applications, and even salary bonuses.

Only journals listed in the Science Citation Index Expanded (SCIE) and Social Sciences Citation Index (SSCI) receive an Impact Factor.

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About SCI

SCI is a multidisciplinary citation index. Science Citation Index covers 9,000+ journals across 177 scientific disciplines. SCI was established in 1900 to the current. SCI-indexed journals are indexed by SCI and SSCI. SCI is described as the world's leading journal.

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