Plasma Sources Science and Technology Impact factor 2025

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The latest impact factor of Plasma Sources Science and Technology and all the other Web of Science journals was released on 20th June 2025 by Clarivate. Through this web page, researchers can check the impact factor, total citation, journal quartile, and journal aim & scope.

Plasma Sources Science and Technology: Aim & Scope

Plasma Sources Science and Technology is a Web of Science indexed journal tha publishes research in the area: Condensed Matter Physics (Q2).
The ISSN of this journal is 13616595, 09630252.

Impact factor of Plasma Sources Science and Technology

Journal Title	Plasma Sources Science and Technology
Impact Factor
SJR	0.727
ISSN	13616595, 09630252
Quartile	Q2

The Journal Impact Factor is defined as citations to the journal in the JCR year to items published in the previous two years, divided by the total number of scholarly items, also known as citable items, (these comprise articles and reviews) published in the journal in the previous two years.

Impact factor data has a strong influence on the scientific community, affecting decisions on where to publish, whom to promote or hire, the success of grant applications, and even salary bonuses.

Only journals listed in the Science Citation Index Expanded (SCIE) and Social Sciences Citation Index (SSCI) receive an Impact Factor.

Similiar journals to publish

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Plasma Sources Science and Technology

ISSN: 13616595, 09630252
Journal Impact:
Journal Scope: Condensed Matter Physics (Q2)

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Journal Impact: 3.3
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Journal Impact:
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Journal Impact:
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Journal Impact:
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Journal Impact:
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LIAS-JOURNAL OF EARLY MODERN INTELLECTUAL CULTURE AND ITS SOURCES

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Journal Impact: 0.1
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About SCI

SCI is a multidisciplinary citation index. Science Citation Index covers 9,000+ journals across 177 scientific disciplines. SCI was established in 1900 to the current. SCI-indexed journals are indexed by SCI and SSCI. SCI is described as the world's leading journal.

All journals covered in this database are reviewed for sufficiently high quality each year.

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